Silicon Nitride Films Deposited at RoomTemperature with an ECR-CVD System
碩士 === 國立清華大學 === 電子工程研究所 === 93 === Decreasing the temperature at which dielectrics are deposited without causing any deterioration of the dielectrics properties has become a priority in the thin film research area. Low-temperature deposition is needed, for example, for producing thin film transist...
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| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/82611313352848976519 |