Application of Reactively Sputtered Zr-Based Binary and Ternary Thin Films to Copper Metallization Process
碩士 === 逢甲大學 === 產業研發碩士班 === 94 === The research uses reactive sputtering to deposit ultra thin (10 nm) ZrN and ZrTiN thin films on silicon wafers (and thermally oxidized SiO2) in Ar/N2 mixed atmospheres of various partial pressure ratios (PN/Ar), and then employs four-point probe, X-ray diffraction...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64406878483895808680 |