Measurement of Residual Stresses in Thin Films Using Spiral Microstructures

碩士 === 國立高雄第一科技大學 === 機械與自動化工程所 === 94 === ABSTRACT This research uses spiral microstructures to measure the residual stresses of the thin films for MEMS devices. In order to understand the effectiveness of the residual stresses on spiral microstructures, the formulation is derived and then the theo...

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Bibliographic Details
Main Authors: Chang-Tsai Li, 李昶材
Other Authors: Chen-Jung Li
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/23743389015620598924
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Summary:碩士 === 國立高雄第一科技大學 === 機械與自動化工程所 === 94 === ABSTRACT This research uses spiral microstructures to measure the residual stresses of the thin films for MEMS devices. In order to understand the effectiveness of the residual stresses on spiral microstructures, the formulation is derived and then the theoretical analysis is conducted. The results conclude that mean normal stresses would stretch or compress the spiral microstructures, and that strain or stress gradients would change the height and diameter of the microstructures and also result in the angular rotation of the microstructure’s end point. These geometric changes are utilized to determine the residual mean normal stresses and gradient stresses. In addition, the finite element analysis is also conducted to verify the results. To minimize the measurement errors, the Taguchi method is used to optimize the dimensions of the spiral microstructures. Finally, experiments are conducted to verify the theoretical results