Characteristic Analysis of Polishing System for Low Stress CMP Process
碩士 === 國立中正大學 === 機械工程所 === 95 === As the speed requirement of electronic devices becomeaq higher and higher, signal transmission delay time must be reduced to meet the requirement. However, the speed is limited by the transmission line with a RC time constant. Utilizing the materials such as copper...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/00249900843223668900 |