Effects of Passivation Layers on Characteristics of GaN-Based Light-Emitting Diodes

碩士 === 國立中興大學 === 精密工程學系所 === 95 === Dielectric thin-film materials such as SiNx and SiO2 are widely used in the semiconductor industry. In this thesis, the dielectric passivation layers deposited by plasma-enhanced chemical vapor deposition were attempted to protect the GaN light-emitting diodes (L...

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Bibliographic Details
Main Authors: Chung-Yi Lin, 林中一
Other Authors: 武東星
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/70023580408584659087