Atomic Layer Deposition of High-k Thin Films used for Metal-Oxide-Semiconductor and Metal-Insulator-Metal application
博士 === 國立清華大學 === 材料科學工程學系 === 95 === In this thesis, we use the atomic-layer-deposition (ALD) technique to prepare high-κ dielectrics, including HfO2 and HfO2 incorporated with Al into different structures, on H-terminated silicon substrate、hydrous-plasma-treated Pt and TiN bottom electrodes for MO...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/53703556294263651663 |