Threshold Damage of Al film by 248 nm KrF Excimer Laser

• Main Authors: Han-chun Tsao, 曹漢君
• Other Authors: Cheng-Yi Liu
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/02255568783094025112

碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 96 === We estimate feasibility and life time of Al metal mask that applied to technology of etching and Laser Writing. According to coating layer of metal mask that have high characteristics of resisting laser ability, we compare Al film that have high reflectivity and good heat conductivity with Al-Ni alloy film that have better hardness and heat performance, that apply to coating layer of metal mask. First, we determine the threshold damage condition of thin film by measure change of penetration of thin film after laser irradiate. Then to the different thickness''s Al thin film (2 μm and 1 μm) as well as thickness is 1 μm Al (3.5 wt.% Ni) thin film, does the thin film anti-laser experiment. We find that thick thin film (2 μm) and increased the Ni alloy film, will have the good anti-laser ability, but the thin film surface damage state will also have a difference, and we will propose the explanation to its influence mechanism.