The Study of Titanium Oxide Thin Film Prepared by RF Sputtering
碩士 === 國立高雄第一科技大學 === 光電工程研究所 === 96 === This thesis is to study the characteristics of the Titanium Oxide thin films deposited on Silicon Wafer substrate by Radio Frequency magnetron sputtering using Ti target in plasma of Argon and Oxygen mixtures. The experimental parameters are including chamber...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93gns7 |