ZnO and ZnO-based Heterojunctions Grown by Fast Pulsed Laser Deposition
博士 === 國立臺灣大學 === 物理研究所 === 96 === Fast pulsed laser deposition (FPLD) process is presented for the epitaxial growth of ZnO thin films, and n-ZnO/p-Si p-n junctions. A diode-pumped solid-state laser (355 nm wavelength, 15 ns pulse width) running at 10 kHz was used to ablate the ZnO target for FPLD p...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/61052805726962810816 |