Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃

碩士 === 國立臺灣科技大學 === 電子工程系 === 96 === Organic thin film transistors (OTFTs) have made impressive progress over the past decades, and it is now likely that OTFTs will find their applications in a number of ways. OTFTs basically provide two principal advantages over Si-based TFTs in processes and appli...

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Main Authors: Chang-Chih Lin, 林昶志
Other Authors: Ching-Lin Fan
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/44887263876958238969
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spelling ndltd-TW-096NTUS54280782016-05-13T04:15:16Z http://ndltd.ncl.edu.tw/handle/44887263876958238969 Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃ 100℃以下製作有機薄膜電晶體特性之研究 Chang-Chih Lin 林昶志 碩士 國立臺灣科技大學 電子工程系 96 Organic thin film transistors (OTFTs) have made impressive progress over the past decades, and it is now likely that OTFTs will find their applications in a number of ways. OTFTs basically provide two principal advantages over Si-based TFTs in processes and application: low thermal budget and low cost. One important factor for low temperature process may be how to fabricate a gate dielectric film at a low temperature. This is a difficult challenge. We report on the fabrication of pentacene thin-film transistors (TFTs) with SiO2 films as the gate dielectric that has been deposited on a heavily doped Si-wafer by Hollow Cathode CVD at low temperature. Although the SiO2 was expected to show lower insulating properties than HDP-CVD SiO2, the surface properties exhibited smooth and a hydrophobic character. Therefore, the pentacene grain size on Hollow Cathode CVD SiO2 is much larger than HDP-CVD SiO2. Based on these arguments, it may result in OTFT using low-temperature hollow cathode CVD SiO2 with higher field mobility and on current. Our work demonstrates that 80 ℃-deposited SiO2 is not only promising gate dielectric material for organic TFTs, but also providing good transistors characteristic. We also investigated the influence of the influence of different measuring environment on the electrical characteristics of pentacene-based thin film transistors. Through surface morphology analysis by atomic force microscopy (AFM) and absorption analysis by infrared (IR) spectroscopy, it was found that the adsorption of H2O on the pentacene layer was the main reason for the degradation. Therefore, we have demonstrated the number of the moisture is a important factor on the electrical characteristics of pentacene-based thin film transistors. Ching-Lin Fan 范慶麟 2008 學位論文 ; thesis 86 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 國立臺灣科技大學 === 電子工程系 === 96 === Organic thin film transistors (OTFTs) have made impressive progress over the past decades, and it is now likely that OTFTs will find their applications in a number of ways. OTFTs basically provide two principal advantages over Si-based TFTs in processes and application: low thermal budget and low cost. One important factor for low temperature process may be how to fabricate a gate dielectric film at a low temperature. This is a difficult challenge. We report on the fabrication of pentacene thin-film transistors (TFTs) with SiO2 films as the gate dielectric that has been deposited on a heavily doped Si-wafer by Hollow Cathode CVD at low temperature. Although the SiO2 was expected to show lower insulating properties than HDP-CVD SiO2, the surface properties exhibited smooth and a hydrophobic character. Therefore, the pentacene grain size on Hollow Cathode CVD SiO2 is much larger than HDP-CVD SiO2. Based on these arguments, it may result in OTFT using low-temperature hollow cathode CVD SiO2 with higher field mobility and on current. Our work demonstrates that 80 ℃-deposited SiO2 is not only promising gate dielectric material for organic TFTs, but also providing good transistors characteristic. We also investigated the influence of the influence of different measuring environment on the electrical characteristics of pentacene-based thin film transistors. Through surface morphology analysis by atomic force microscopy (AFM) and absorption analysis by infrared (IR) spectroscopy, it was found that the adsorption of H2O on the pentacene layer was the main reason for the degradation. Therefore, we have demonstrated the number of the moisture is a important factor on the electrical characteristics of pentacene-based thin film transistors.
author2 Ching-Lin Fan
author_facet Ching-Lin Fan
Chang-Chih Lin
林昶志
author Chang-Chih Lin
林昶志
spellingShingle Chang-Chih Lin
林昶志
Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃
author_sort Chang-Chih Lin
title Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃
title_short Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃
title_full Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃
title_fullStr Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃
title_full_unstemmed Study on Characteristics of Pentacene-Based Thin-Film Transistors fabricated below 100 ℃
title_sort study on characteristics of pentacene-based thin-film transistors fabricated below 100 ℃
publishDate 2008
url http://ndltd.ncl.edu.tw/handle/44887263876958238969
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