Study of Microstructure and Photoelectrical Properties forMicrocrystalline Silicon Germanium Thin Film Prepared byHDP-CVD
碩士 === 崑山科技大學 === 機械工程研究所 === 97 === To improve the efficiency of the solar cell device, a microcrystalline silicon-germanium (μc-Si1-xGex) thin film fabricated by a high density plasma chemical vapor depo-sition is studied. Several process parameters, such as the gas flows of GeH4、SiH4 and hydrogen...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/429477 |