Photoresponse of Phase Separated Hafnium Silicate in Metal-Oxide-Semiconductor Structure
碩士 === 國立成功大學 === 電機工程學系碩博士班 === 97 === In this paper, the objective of the hafnium silicate material as a MIS structure of oxide layer and to study their photoresponse. Hafnium silicate oxide layer after heat treatment at high temperature will produce the phenomenon of phase separation, the formati...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/62993105976491111626 |