Nanometer Technology Cell Migration Considering Redundant Contact/Via and Topology Preservation
碩士 === 國立交通大學 === 資訊科學與工程研究所 === 97 === To avoid wasting man power and design time, layout migration plays an important role in the re-design of a cell library and full-custom block. Traditional layout migration suffers the disadvantage of shape distortion of objects and destruction to topology betw...
Main Authors: | Chien-Liang Tsai, 蔡建樑 |
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Other Authors: | Yih-Lang Li |
Format: | Others |
Language: | en_US |
Published: |
2008
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Online Access: | http://ndltd.ncl.edu.tw/handle/85801634595858973256 |
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