Fabrication of Micron and Submicron Compound Structures by Combining Interference Lithography and Nanoimprint Lithography

• Main Authors: Hsin-Chieh Chiu, 邱信傑
• Other Authors: Lon A. Wang
• Format: Others
• Language: en_US
• Published: 2009
• Online Access: http://ndltd.ncl.edu.tw/handle/15234171222560412024

碩士 === 國立臺灣大學 === 光電工程學研究所 === 97 === It has been reported that the two dimensional sub-wavelength periodic structures would result in excellent broadband anti-reflection with wide incident angles. Though this technique is not widely used to replace traditional thin film coating presently, it is ex-pected to become a more suitable solution when applied to ever smaller optical elements. However, we could anticipate that this kind of structure will be widely applied to solar cells, LCD displays, and LED light extraction, etc. In this thesis, we will study and fabricate sub-wavelength structures on silicon sub-strates by utilizing two-beam interference lithography and semiconductor process. More-over, by means of reactive ion etching (RIE) and inductive couple plasma (ICP) etching system, different etching recipes to fabricate different sidewalls of the sub-wavelength structures into silicon substrates are obtained. Subsequently, the reflective phenomena of different samples influenced by the sidewall are studied. A novel method is also reported for transferring the sub-wavelength structures from flat surfaces to the curved surfaces of micro lens. This method is to combine the nanoim-print and the hot-extrusive shaping techniques, and it is very simple and time-saving. By using the method, nanostructures can be integrated on microstructures as an artificial compound eye structure. Furthermore, a commercial optical microscope is applied to con-firming the effect of anti-reflection on such a single compound eye structure.