| Summary: | 碩士 === 明志科技大學 === 材料工程研究所 === 100 === In this syudy, Cu2O films were electrodeposited on the FTO transparent conducting glass. A conventional cell of 3-electrodes was used for the photoelectrochemical testings. The water solution for the experiments consists of 0.5 M Na2SO4 and additive of NiSO4. The NiSO4 plays a role as a catalyst for the promotion of hydrogen production. All tested samples are (111) prefer-orientated. A halogen lamp of 150 W was used as the light source for the experiment of photoelectrochemical properties. Structure and composition of the films were detected by using using XRD,FE-SEM and EDS.
Experimental results show that Cu2O have photoelectrochemical effect. By the cathodic cyclic voltammetry (CV) scan, the cathodic current response for those with additive of NiSO4 catalyst was obviously higher than those without catalyst. The current increased with increasing the content of additive and the time of light exposure. According to EDS results , more additive content and longer exposure time resulted in higher composition of reduced nickel on the film surface. According to the XRD results, the Cu2O film was partly reduced and deposited on the film surface, which was scanned by using cathodic cyclic voltammetry in the range of 0 to -1 V (vs. OCP).
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