Fabrication of N-type organic thin-film transistors with silk fibroin as the gate dielectric

碩士 === 國立清華大學 === 材料科學工程學系 === 100 === In this thesis, we have used silk fibroin as the gate dielectric layer and chosen PTCDI-C8 and F16CuPc as N-type semiconductor materials to fabricate organic thin-film transistors (OTFTs). PTCDI-C8 and F16CuPc were usually deposited on SiO2 in the fabrication o...

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Bibliographic Details
Main Authors: Tsai, Cheng-Lun, 蔡政倫
Other Authors: Hwang, Jenn-Chang
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/18276129050896521533