Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment

碩士 === 國立清華大學 === 工程與系統科學系 === 100

Bibliographic Details
Main Authors:	Hong, Hao-Zhi, 洪晧智
Other Authors:	Chang-Liao, Kuei-Shu
Format:	Others
Language:	zh-TW
Published:	2012
Online Access:	http://ndltd.ncl.edu.tw/handle/03979910865620437749

id	ndltd-TW-100NTHU5593046
record_format	oai_dc
spelling	ndltd-TW-100NTHU55930462015-10-13T21:22:42Z http://ndltd.ncl.edu.tw/handle/03979910865620437749 Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment 應用較高介電層及電漿處理界面層以改善金氧半元件電特性 Hong, Hao-Zhi 洪晧智碩士國立清華大學工程與系統科學系 100 Chang-Liao, Kuei-Shu 張廖貴術 2012 學位論文 ; thesis 114 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立清華大學 === 工程與系統科學系 === 100
author2	Chang-Liao, Kuei-Shu
author_facet	Chang-Liao, Kuei-Shu Hong, Hao-Zhi 洪晧智
author	Hong, Hao-Zhi 洪晧智
spellingShingle	Hong, Hao-Zhi 洪晧智 Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment
author_sort	Hong, Hao-Zhi
title	Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment
title_short	Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment
title_full	Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment
title_fullStr	Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment
title_full_unstemmed	Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment
title_sort	improvement of electrical characteristics in mos devices with higher-k dielectrics and interfacial layer by plasma treatment
publishDate	2012
url	http://ndltd.ncl.edu.tw/handle/03979910865620437749
work_keys_str_mv	AT honghaozhi improvementofelectricalcharacteristicsinmosdeviceswithhigherkdielectricsandinterfaciallayerbyplasmatreatment AT hónghàozhì improvementofelectricalcharacteristicsinmosdeviceswithhigherkdielectricsandinterfaciallayerbyplasmatreatment AT honghaozhi yīngyòngjiàogāojièdiàncéngjídiànjiāngchùlǐjièmiàncéngyǐgǎishànjīnyǎngbànyuánjiàndiàntèxìng AT hónghàozhì yīngyòngjiàogāojièdiàncéngjídiànjiāngchùlǐjièmiàncéngyǐgǎishànjīnyǎngbànyuánjiàndiàntèxìng
_version_	1718062812057567232

Improvement of Electrical Characteristics in MOS Devices with Higher-k Dielectrics and Interfacial Layer by Plasma Treatment

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