Application Technique of Stacking High-k Dielectric Materials on MOS Device
博士 === 國立臺灣大學 === 電子工程學研究所 === 100 === The result of this dissertation was divided into two parts. In the first part, it includes anodic oxidation (anodization) process，alternating-current anodization compensation technique and tandem structure to improve high-k dielectrics materials on Si subst...
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/62265826364008893915 |