Effect of Plasma Treatment on Structural, Electrical, and Reliability Characteristics of Porous Low-k Dielectrics
碩士 === 國立暨南國際大學 === 電機工程學系 === 101 === This thesis investigates the effect of different kinds of plasma on porous low-k dielectric materials. It can be divided into three parts. The first part is about the effect of H2/He plasma for low dielectric (low-k) materials by using standard and remote plasm...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/78122650769698899741 |