Comparison of the performance of different cleaning methods for lithography masks
碩士 === 國立交通大學 === 工學院永續環境科技學程 === 101 === How to reduce the formation of photo-induced defect has becomes a big challenge in the manufacture of semiconductors. When the critical dimension gets smaller and smaller, the exposure wavelength changed from G-line (436nm) in the early years, then it comes...
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| Format: | Others |
| Language: | zh-TW |
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2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02570650397933123495 |