Fabrication and Characteristics Analysis of V-doped Bi3.4Nd0.6Ti3O12 Ferroelectric Thin Films
碩士 === 南台科技大學 === 電子工程系 === 101 === In this study, by the RF magnetron sputtering, the Bi3.4Nd0.6Ti2.3V0.7O12 (BNTV) ferroelectric thin films were deposited on the ITO/glass substrates to form a Metal- insulator-Metal (MIM) structure. And the effects of the oxygen concentration and RF power and cham...
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| Format: | Others |
| Language: | zh-TW |
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48101692472792852231 |