Microstructure and Magnetic Properties of Nano Cobalt Thin Films after Ar Ion Beam Bombardment
碩士 === 國立中興大學 === 材料科學與工程學系所 === 102 === In this study, dual ion beam sputtering system is adopted to prepare the Aluminum / Cobalt films on silicon. The microstructure and magnetic properties of the Al/Co films through ion beam bombardment for ten minutes have been studied. In this experiment, X-ra...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2014
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Online Access: | http://ndltd.ncl.edu.tw/handle/64825330615217380650 |