Effects of ammonia/propane ratios on characteristicsof plasma enhanced chemical vapor deposition n-type amorphous carbon thin films
碩士 === 國立中興大學 === 材料科學與工程學系所 === 102 === The study investigates the effects of different NH3/C3H8 ratios on the properties of n-type amorphous hydrogenated carbon a-C:N films deposited on p-type silicon substrate prepared by plasma enhanced chemical vapor deposition. The plasma diagn...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/95376665946260500088 |