Modeling and Design a New Gas Injection Diffusion System by Barrier and Purge on Horizontal MOCVD Reactor
碩士 === 國立中央大學 === 機械工程學系 === 102 === Metal–Organic Chemical Vapor Deposition, MOCVD, is one of the most important technologies to manufacture the LED. By introducing MO source and group V gas into the reactor, then deposits the thin film on the high temperature susceptor. The key components, a gas i...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/njrwvq |