Development of Patterned Silicon Substrate by Gas-Assisted Imprinting
碩士 === 國立臺灣科技大學 === 機械工程系 === 103 === This study is to develop the manufacturing technology of patterning on Silicon substrate for high power GaN (Gallium Nitride) devices. Patterning problem is the most important and major issue of epitaxial growth of GaN on Silicon. The stepper lithography is usua...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/47338162695570025100 |