Step Coverage Study of Through Silicon Via in Sputter Process

碩士 === 國立高雄大學 === 電機工程學系--先進電子構裝技術產業研發碩士專班 === 103 === This thesis studied the step coverage performance of titanium-copper (Ti-Cu) in silicon wafer with different via width and depth in sputter process. The film uniformities in the deposition of Ti and Cu respectively with different platen power an...

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Bibliographic Details
Main Authors: Chung-heng Liao, 廖崇亨
Other Authors: Wen-How Lan
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/39289694403950281787