Preparation of Organic and Inorganic Silicon-Based Thin Films Using High Plasma Deposition Monitored by Optical Emission Spectroscopy
碩士 === 大葉大學 === 電機工程學系 === 104 === In this study, an optical emission spectrometer (OES) is used to in-situ monitor the variation of plasma radical distribution during the deposition of organic/inorganic silicon thin films by using inductively coupled plasma chemical vapor deposition. For inorganic...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/30022651992753096741 |