Electroless Copper Deposition on Silane Modified IC Substrate

碩士 === 國立清華大學 === 化學工程學系所 === 105 === Traditional electroless copper deposition technology cannot satisfy the requirement of fine linewidth and minimal signal loss, which are the features of advanced circuitry. To meet the feature of fine linewidth and minimal signal loss of advanced circuit, modern...

Full description

Bibliographic Details
Main Authors: Chang, Ching-Jui, 章景睿
Other Authors: Wei, Tzu-Chien
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/q5txsc
id ndltd-TW-105NTHU5063032
record_format oai_dc
spelling ndltd-TW-105NTHU50630322019-05-15T23:53:46Z http://ndltd.ncl.edu.tw/handle/q5txsc Electroless Copper Deposition on Silane Modified IC Substrate 矽烷表面改質於IC載板上無電鍍銅層之研究 Chang, Ching-Jui 章景睿 碩士 國立清華大學 化學工程學系所 105 Traditional electroless copper deposition technology cannot satisfy the requirement of fine linewidth and minimal signal loss, which are the features of advanced circuitry. To meet the feature of fine linewidth and minimal signal loss of advanced circuit, modern substrates are made flat and does not allow massively roughened. In this study, we aim to modify the surface of Ajinomoto Build-up Film (ABF) by the formation of the covalent bond between silane, 3-2-(2-amionethylamino) ethylamino propyl trimethoxysilane (ETAS) and substrate. After ETAS modification, home-made polyvinyl alcohol capped palladium(PVA-Pd) nanoparticles were adsorbed onto ETAS-modified ABF film to catalyze electroless copper plating. To enhance the adhesion by interaction of ETAS with PVA-Pd. In the first part of this study, we analyze the effect of ETAS modification on ABF GX-T37 by water contact angle, atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS). Meanwhile, the adhesion of electroless copper layers prepared using commercial catalyst (Sn/Pd and Pd-ion) were compared. Finally, the relationship between ETAS modification and the adhesion has been connected. Although repeating the adhesion tests, the result show low reproducibility between the ABF GX-T37substrates fabricated by different lots. Therefore, the following analysis of morphology of substrate was carried out to clarify the effect of desmear process on adhesion. In the second part of this study, we focused on the morphological features of different types of ABF substrate after desmear process using scanning electron microscope (SEM) and Energy-Dispersive Spectroscopy (EDS) and AFM. Moreover, we scrutinized the profile at copper/substrate interface. Finally, we found out the major factor on influencing adhesion between electroless copper layer and ABF substrate. Furthermore, we are looking forward to apply this technic into the commercialized ABF GX-13 substrate. Wei, Tzu-Chien 衛子健 2017 學位論文 ; thesis 88 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 化學工程學系所 === 105 === Traditional electroless copper deposition technology cannot satisfy the requirement of fine linewidth and minimal signal loss, which are the features of advanced circuitry. To meet the feature of fine linewidth and minimal signal loss of advanced circuit, modern substrates are made flat and does not allow massively roughened. In this study, we aim to modify the surface of Ajinomoto Build-up Film (ABF) by the formation of the covalent bond between silane, 3-2-(2-amionethylamino) ethylamino propyl trimethoxysilane (ETAS) and substrate. After ETAS modification, home-made polyvinyl alcohol capped palladium(PVA-Pd) nanoparticles were adsorbed onto ETAS-modified ABF film to catalyze electroless copper plating. To enhance the adhesion by interaction of ETAS with PVA-Pd. In the first part of this study, we analyze the effect of ETAS modification on ABF GX-T37 by water contact angle, atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS). Meanwhile, the adhesion of electroless copper layers prepared using commercial catalyst (Sn/Pd and Pd-ion) were compared. Finally, the relationship between ETAS modification and the adhesion has been connected. Although repeating the adhesion tests, the result show low reproducibility between the ABF GX-T37substrates fabricated by different lots. Therefore, the following analysis of morphology of substrate was carried out to clarify the effect of desmear process on adhesion. In the second part of this study, we focused on the morphological features of different types of ABF substrate after desmear process using scanning electron microscope (SEM) and Energy-Dispersive Spectroscopy (EDS) and AFM. Moreover, we scrutinized the profile at copper/substrate interface. Finally, we found out the major factor on influencing adhesion between electroless copper layer and ABF substrate. Furthermore, we are looking forward to apply this technic into the commercialized ABF GX-13 substrate.
author2 Wei, Tzu-Chien
author_facet Wei, Tzu-Chien
Chang, Ching-Jui
章景睿
author Chang, Ching-Jui
章景睿
spellingShingle Chang, Ching-Jui
章景睿
Electroless Copper Deposition on Silane Modified IC Substrate
author_sort Chang, Ching-Jui
title Electroless Copper Deposition on Silane Modified IC Substrate
title_short Electroless Copper Deposition on Silane Modified IC Substrate
title_full Electroless Copper Deposition on Silane Modified IC Substrate
title_fullStr Electroless Copper Deposition on Silane Modified IC Substrate
title_full_unstemmed Electroless Copper Deposition on Silane Modified IC Substrate
title_sort electroless copper deposition on silane modified ic substrate
publishDate 2017
url http://ndltd.ncl.edu.tw/handle/q5txsc
work_keys_str_mv AT changchingjui electrolesscopperdepositiononsilanemodifiedicsubstrate
AT zhāngjǐngruì electrolesscopperdepositiononsilanemodifiedicsubstrate
AT changchingjui xìwánbiǎomiàngǎizhìyúiczàibǎnshàngwúdiàndùtóngcéngzhīyánjiū
AT zhāngjǐngruì xìwánbiǎomiàngǎizhìyúiczàibǎnshàngwúdiàndùtóngcéngzhīyánjiū
_version_ 1719156978299699200