Characterization of Plasma-treated HfZrO2 Ferroelectric Film and Its Applications on Nanosheet Junctionless FETs
碩士 === 國立臺灣科技大學 === 電子工程系 === 107 === This thesis studies the characteristics of HfZrO2 ferroelectric thin films, and the application on the gate oxide of Nanosheet Junctionless FETs (NS-JLFETs). This study is divided into two parts. The first part is to improve the polarization characteristics of H...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/5ts4q3 |