The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter

碩士 === 南臺科技大學 === 電子工程系 === 107 === It is well known that zinc oxide (ZnO) is a non-toxic, inexpensive, and thermally stable wide band-gap material. It is widely used in thin-film transistor and ultraviolet photodetector. The energy bandgap of magnesium zinc oxide (MgZnO) can be changed with the mod...

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Main Authors: LIAO, WEI-HSU, 廖偉旭
Other Authors: WANG, CHUN-KAI
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/bkj4vb
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spelling ndltd-TW-107STUT04270102019-10-07T03:38:52Z http://ndltd.ncl.edu.tw/handle/bkj4vb The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter 利用射頻磁控濺鍍法製作不同厚度之氧化鎂鋅雙波段金半金光檢測器之研究 LIAO, WEI-HSU 廖偉旭 碩士 南臺科技大學 電子工程系 107 It is well known that zinc oxide (ZnO) is a non-toxic, inexpensive, and thermally stable wide band-gap material. It is widely used in thin-film transistor and ultraviolet photodetector. The energy bandgap of magnesium zinc oxide (MgZnO) can be changed with the modulation of magnesium content, which can detect a light wavelength up to 200 nm and can be used in UVA, UVB, and UVC photodetector. In this study, the different thicknesses of thin film ZnO/MgZnO were deposited on quartz substrate by the RF magnetron sputtering technique and its thin film properties were physically analyzed by SEM, XRD, XPS, PL and spectroscope. Then, a dual-band metal-semiconductor-metal (MSM) photodetector was fabricated by inserted an isolating layer of silicon dioxide (SiO2) between the ZnO and MgZnO and its optoelectronic properties were also investigated. There were three parts of the proposed experiment. First, a dual-band photodetector was fabricated by the stacking of the thin films of MgZnO with 10% and 20% magnesium content. The response characteristic of this dual-band photodetector was poor due to the diffusion of the magnesium atoms. Thus, we attempted to insert a layer of SiO2 to avoid the diffusion of the magnesium atoms. In order to further improve the dual-band characteristic of photodetector, in the third part of the experiment, the bottom layer of MgZnO with 10% magnesium content was replaced by ZnO. And, upper layer of MgZnO with 20% magnesium content was deposited with the thicknesses of 100 nm, 150 nm, and 200 nm, respectively, on top of the SiO2 isolating layer. It was found that the ZnO/MgZnO photodetector with a MgZnO thickness of 200 nm showed a lower dark current and better dual-band response. Such a result is attributed to the larger grain size and higher absorptive response of MgZnO as the thickness of MgZnO increased. Therefore, we successfully fabricate a significantly better response of the dual-band ZnO/MgZnO photodetector. WANG, CHUN-KAI 王俊凱 2019 學位論文 ; thesis 84 zh-TW
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language zh-TW
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description 碩士 === 南臺科技大學 === 電子工程系 === 107 === It is well known that zinc oxide (ZnO) is a non-toxic, inexpensive, and thermally stable wide band-gap material. It is widely used in thin-film transistor and ultraviolet photodetector. The energy bandgap of magnesium zinc oxide (MgZnO) can be changed with the modulation of magnesium content, which can detect a light wavelength up to 200 nm and can be used in UVA, UVB, and UVC photodetector. In this study, the different thicknesses of thin film ZnO/MgZnO were deposited on quartz substrate by the RF magnetron sputtering technique and its thin film properties were physically analyzed by SEM, XRD, XPS, PL and spectroscope. Then, a dual-band metal-semiconductor-metal (MSM) photodetector was fabricated by inserted an isolating layer of silicon dioxide (SiO2) between the ZnO and MgZnO and its optoelectronic properties were also investigated. There were three parts of the proposed experiment. First, a dual-band photodetector was fabricated by the stacking of the thin films of MgZnO with 10% and 20% magnesium content. The response characteristic of this dual-band photodetector was poor due to the diffusion of the magnesium atoms. Thus, we attempted to insert a layer of SiO2 to avoid the diffusion of the magnesium atoms. In order to further improve the dual-band characteristic of photodetector, in the third part of the experiment, the bottom layer of MgZnO with 10% magnesium content was replaced by ZnO. And, upper layer of MgZnO with 20% magnesium content was deposited with the thicknesses of 100 nm, 150 nm, and 200 nm, respectively, on top of the SiO2 isolating layer. It was found that the ZnO/MgZnO photodetector with a MgZnO thickness of 200 nm showed a lower dark current and better dual-band response. Such a result is attributed to the larger grain size and higher absorptive response of MgZnO as the thickness of MgZnO increased. Therefore, we successfully fabricate a significantly better response of the dual-band ZnO/MgZnO photodetector.
author2 WANG, CHUN-KAI
author_facet WANG, CHUN-KAI
LIAO, WEI-HSU
廖偉旭
author LIAO, WEI-HSU
廖偉旭
spellingShingle LIAO, WEI-HSU
廖偉旭
The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter
author_sort LIAO, WEI-HSU
title The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter
title_short The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter
title_full The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter
title_fullStr The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter
title_full_unstemmed The Study of MgxZn1-xO Dual-Band Metal-Semiconductor-Metal Photodetector with Different Thicknesses by RF Magnetron Sputter
title_sort study of mgxzn1-xo dual-band metal-semiconductor-metal photodetector with different thicknesses by rf magnetron sputter
publishDate 2019
url http://ndltd.ncl.edu.tw/handle/bkj4vb
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