Supercritical fluid deposition of thin metal films: Kinetics, mechanics and applications

In order to meet the demands of the continuous scaling of electronic devices, new technologies have been developed over the years. As we approach the newest levels of miniaturization, current technologies, such as physical vapor deposition and chemical vapor deposition, are reaching a limitation in...

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Bibliographic Details
Main Author: Karanikas, Christos Fotios
Language:ENG
Published: ScholarWorks@UMass Amherst 2008
Subjects:
Online Access:https://scholarworks.umass.edu/dissertations/AAI3359900

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