Phase-Field Modeling of Electromigration-Mediated Morphological Evolution of Voids in Interconnects

abstract: Miniaturization of microdevices comes at the cost of increased circuit complexity and operating current densities. At high current densities, the resulting electron wind imparts a large momentum to metal ions triggering electromigration which leads to degradation of interconnects and solde...

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Bibliographic Details
Other Authors: Vemulapalli, Sree Shivani (Author)
Format: Dissertation
Language:English
Published: 2020
Subjects:
Online Access:http://hdl.handle.net/2286/R.I.57105