Etching and chemomechanical polishing of compound semiconductors using halogen-based reagents
The reactions of dichlorine and dibromine on compound semiconductors follow a pattern of halogenation of the substrate surface, followed by solvation of the halogenated products and removal of the secondary products in the etchant solutions. The reactions of hypochlorite and hydrogen peroxide follow...
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University of Glasgow
1996
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.320293 |