Structural Characterization on Different Type of Silicon Wafer on the Formation of Porous Silicon Structure
A set of n-type and p-type porous silicon (PS) layers were fabricated by photoelectrochemical etching using direct current (DC) and pulse current (PC) techniques. The study aims to compare the effect of different wafer type on the formation of the PS structure. The samples were etched in a solution...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Institute of Physics Publishing,
2020
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| Subjects: | |
| Online Access: | View Fulltext in Publisher View in Scopus |