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1by Ihekire, Chika LucySubjects: “...Engineering|Chemical engineering...”
Published 2016
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4by Sorooshian, Jamshid“..., temperature and kinematics on inter-level dielectric (ILD) and metal chemical mechanical planarization (CMP...”
Published 2005
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6by Moore-Nall, Anita Louise“.... Structural data support fracturing accompanied by tectonic hydrothermal brecciation as a process...”
Published 2017
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7by Mushonga, Sylvester PaulSubjects: “...Engineering|Chemical engineering...”
Published 2015
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8by Bakhurji, Khalid A.Subjects: “...Chemical engineering|Electrical engineering...”
Published 2015
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9by Choo, YoungwooSubjects: “...Chemical engineering|Nanotechnology|Materials science...”
Published 2019
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10by Muthukumaran, Ashok Kumar“.... Development of a full sequence ECMP process would require the removal of the barrier layer as well. Chemical...”
Published 2008
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13by Missi, Charles“... the hydrogeochemical processes that control water quality. Groundwater in the Lake Chilwa Basin are highly saline which...”
Published 2019
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14by Rosales-Yeomans, Daniel“... 100-mm) polisher during ILD CMP. Results showed that scaling the ILD process from 100 to 200 mm caused...”
Published 2007
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15by Beheshtaein, SetarehSubjects: “...Chemical engineering|Environmental engineering...”
Published 2016
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16by Gouni, Sreeja ReddySubjects: “...Chemical engineering|Materials science...”
Published 2018
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18by Tobin, Peter H.Subjects: “...Biochemistry|Chemical engineering|Biophysics...”
Published 2015
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19by Klein, Matthew Paul, IIISubjects: “...Chemical engineering|Mechanical engineering...”
Published 2018
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20by Zhu, Hongbin“...The current semiconductor device manufacturing requires more strict control of plasma etching...”
Published 2005
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