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2“...碩士 === 國立成功大學 === 工程科學系 === 89 === In IC package, when EMC filling cavity and curing in transfer...”
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3“... the on-site flow-control technique in IC fabrication. It is different from those designs developed...”
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4“... fabrication to monitor the defect counts on wafers. As the surface area of wafer of IC...”
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5“... the on-site flow-control technique of WIP scatteration in IC fabrication. It is different from those designs...”
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6by Alexander, Walter James Cunningham“... fabrication control, process simulation and experimental design/analysis is also provided to complement...”
Published 1992
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7“...碩士 === 東海大學 === 數學系 === 98 === The on-site flow-control design in the IC fabrication...”
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8“... the on-site flow-control technique of WIP scatteration in IC fabrication. It is different from those designs...”
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10by Ginter, Byron A.“... Aided Design (CAD) and Computer Aided Manufacturing CAM) tools were used for layout and fabrication...”
Published 2013
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11“... computing systems. We are able to mass-produce but cost less by using IC technique...”
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12“... of IC fabrication system. We propose a new flow-control technique called "the interval-smoothness- short...”
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13“...碩士 === 國立交通大學 === 工業工程與管理系 === 89 === IC fabrication plays a key role in Taiwan’s IC...”
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14“... efficiency is improved. This chip is fabricated with TSMC 0.25um CMOS high voltage mixed signal general...”
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15“... to transfer chip information; The chip is fabricated by TSMC 0.18μm 1P6M CMOS technology, including...”
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16by 邱健寶“... to consider thoroughly the designs and the plans before the construction begins, to implement the management...”
Published 2002
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17“... is adopted. The number of components and pins of controller can be reduced. This chip is fabricated with TSMC...”
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18“... and fabricated. This integrated circuit (IC) is designed when the input voltage is operated at 110 V or 220 V...”
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19“... information calculated from NBDP solutions. In this thesis, we design a VLSI implementation...”
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20“... are performed, it is proposed to build a new apparatus specifically designed to develop positron beam alignment...”
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