Showing 1 - 20 results of 28 for search 'SEMICONDUCTOR DEVICES', query time: 0.55s Refine Results
  1. 1
    by Jian-Jiun Huang, 黃健峻
    Published 2009
    ... and devices is a useful method to form metal-oxide-semiconductor HEMT (MOSHEMT). In this thesis, using...
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  2. 2
    by Hsien-ChengLin, 林顯正
    Published 2012
    ...博士 === 國立成功大學 === 微電子工程研究所碩博士班 === 100 === InGaP/InGaAs metal-oxide-semiconductor pseudomorphic...
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  3. 3
    by Chih-ChunHu, 胡智鈞
    Published 2015
    ... devices using a thin insulator film between the gate electrode and the semiconductor. The use...
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  4. 4
    by Chin-YangHsieh, 謝晉陽
    Published 2016
    ... constant thin film of ZrO2. The deposited ZrO2 can improve device properties by repairing surface defects...
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  5. 5
    by Jian-XuanXu, 徐健軒
    Published 2014
    ... gate in AlGaN/GaN HEMTs suffer from high gate leakage current which decrease the devices performance...
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  6. 6
    by Yu-Chun Cheng, 鄭宇鈞
    Published 2008
    ... that improved InGaP/InGaAs pHEMTs performance. In this work, the gate length and width of the device was 0.7μm...
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  7. 7
  8. 8
    by Shun-KaiYang, 楊舜凱
    Published 2019
    .... In this work, gate field plate is used to increase the device’s breakdown voltage. In order to reduce gate...
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  9. 9
    by Sarbani Basu, 石善怡
    Published 2009
    .... Recently four novel insulating gate device types—metal-oxide-semiconductor HFET (MOSHFET) metal-insulator...
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  10. 10
    by FeriAdriyanto, 飛瑞
    Published 2014
    ... are demonstrated. According to the programming/erasing operations, the devices exhibited memory characteristics...
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  11. 11
    by Chih-MingLin, 林志明
    Published 2010
    ... significantly. The active and passive devices fabricated in III-V compound semiconductor technologies exhibit...
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  12. 12
    ... aluminum (Al) thin film micromesh structure. The filter is prepared by the semiconductor process of dc...
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  13. 13
    by Liang-Tang Wang, 王亮棠
    Published 2001
    ...-V) characteristics of metal-oxide- semiconductor (MOS) devices. In capacitance-voltage (C-V...
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  14. 14
    by Chia-YuWei, 魏嘉余
    Published 2012
    ...博士 === 國立成功大學 === 光電科學與工程學系 === 100 === Over the past two decades, organic semiconductors have been...
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  15. 15
    by Wein-Tsong Chang, 張文宗
    Published 2004
    ... the measurement. Also, we use semiconductor process to prove our validity and comparing the difference...
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  16. 16
    by Yu-ChangLi, 李昱璋
    Published 2013
    ... sulfonic acid (PANI-CSA) was proposed. From the experimental results observed, the PANI-CSA device without...
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  17. 17
    by Jau-Yi Wu, 吳昭誼
    Published 2001
    ...) technique for gallium arsenide (GaAs) device applications has been proposed. The oxidation system is simple...
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  18. 18
    by Po-HsiaoChen, 陳柏孝
    Published 2012
    ... to the transformation of IGZO thin film from semiconductor to conductor. To prevent hydrogen in substitution for oxygen...
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  19. 19
    by Ying-Guo Chen, 陳英國
    Published 2007
    ...) and pentacene. Additionally, we use conducting polymer, polyaniline (PANI), as active layer in the device...
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  20. 20
    ...-semiconductor pseudomorphic high-electron-mobility transistor (MOS-PHEMT) using liquid phase deposited titanium...
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