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Characterization of negative tone photoresist mr-EBL 6000.5 for i-line stepper and electron beam lithography for the Intra-Level Mix & Match Approach by S. Schermer, C. Helke, M. Reinhardt, S. Hartmann, F. Tank, J. Wecker, G. Heldt, A. Voigt, D. Reuter
Published in Micro and Nano Engineering (2024-06-01)Get full text
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