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    Effects of Oxygen Plasma Treatment on Fermi‐Level Pinning and Tunneling at the Metal–Semiconductor Interface of WSe2 FETs by Kwangro Lee, Tien Dat Ngo, Sungwon Lee, Hoseong Shin, Min Sup Choi, James Hone, Won Jong Yoo

    Published in Advanced Electronic Materials (2023-03-01)
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