Search Results - V. A. Pilipenko

M. Walker. Branching Is Not a Bug; It’s a Feature: Personal Identity and Legal (and Moral) Responsibility / trans. from Engl. V. A. Pilipenko by V. A. Pilipenko

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The mechanism of mid-latitude Pi2 waves in the upper ionosphere as revealed by combined Doppler and magnetometer observations by V. A. Pilipenko, V. A. Pilipenko, E. N. Fedorov, M. Teramoto, K. Yumoto

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Magnetotelluric sounding of the crust and hydromagnetic monitoring of the magnetosphere with the use of ULF waves by E. N. Fedorov, V. A. Pilipenko

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EFFECT OF RAPID THERMAL TREATMENT ТЕMPERATURE ON ELECTROPHYSICAL PROPERTIES OF NICKEL FILMS ON SILICON by Ja. A. Solovjov, V. A. Pilipenko

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EFFECT OF RAPID THERMAL TREATMENT CONDITIONS ON ELECTROPHYSICAL PROPERTIES OF CROMIUM THIN FILMS ON SILICON by J. A. Solovjov, V. A. Pilipenko

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Effect of Pulsed Photon Processing in Nitrogen Ambient on Optical and Electrophysical Characteristics of Silicon Dioxide Layers of Its Boundaries with Silicon by N. S. Kovalchuk, V. A. Pilipenko, Ja. A. Solovjov

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Rapid thermal treatment robotics unit for creation of electronic equipment devices by V. A. Saladukha, V. A. Pilipenko, V. P. Yakovlev

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Discrimination of ULF signals from an underground seismogenic current by V. A. Pilipenko, N. G. Mazur, E. N. Fedorov

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Influence of the rapid thermal treatment of the gate dielectric on the parameters of integrated circuits of time devices by V. A. Saladukha, V. A. Pilipenko, V. A. Gorushko

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Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide by V. A. Solodukha, V. A. Pilipenko, V. A. Gorushko

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Simulation of silicon wafers heating during rapid thermal processing using “UBTO 1801” unit by J. A. Solovjov, V. A. Pilipenko, V. P. Yakovlev

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Global trends in microelectronics and place of Belarus in this process by A. I. Belous, V. A. Pilipenko, A. S. Turtsevich, S. V. Shvedov

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INFLUENCE OF TIME MODES OF THERMAL TREATMENT ON Pt-Si SYSTEM MICROSTRUCTURE by V. A. Saladukha, V. A. Pilipenko, F. F. Komarov, V. A. Gorushko

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The impact of formation modes of platinum silicide by the quick heat treatment on Schottky diodes parameters by V. A. Saladukha, V. A. Pilipenko, V. A. Gorushko, V. A. Philipenya

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Electron-microscope investigations of the Pt-Si system during its rapid thermal treatment by V. A. Saladukha, V. A. Pilipenko, F. F. Komarov, V. A. Gorushko

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Formation of a gate dielectric of nanometer thickness by rapid thermal treatment by N. S. Kovalchuk, A. A. Omelchenko, V. A. Pilipenko, V. A. Solodukha, D. V. Shestovski

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Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION by E. B. Chubenko, V. P. Bondarenko, V. A. Pilipenko, K. .. Topalli, A. K. Okyay

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METHOD AND CONTROL SET-UP OF SILICON WAFER FLATNESS by V. A. Pilipenko, A. N. Petlitsky, V. A. Gorushko, S. V. Shvedov, V. V. Ponaryadov

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The Influence of Rapid Heat Treatment During the Formation of Aluminum-Polysilicon Contacts on the Electrical Parameters of CMOS Microcircuits by V. A. Pilipenko, N. S. Kovalchuk, Ja. A. Solovjov, D. V. Shestovski, D. V. Zhyhulin

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Reliability Express Control of the Gate Dielectric of Semiconductor Devices by V. A. Solodukha, G. G. Chigir, V. A. Pilipenko, V. A. Filipenya, V. A. Gorushko

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