High Power Sunlight‐Simulated UV‐Induced Radical Polymerization: Self‐Initiation and Self‐Crosslinking

Abstract Under high power UV irradiation, radicals can be generated from double bonds through photodissociation, H‐abstraction, or oxygen initiation mechanisms. This eliminates the need for externally added initiators in photopolymerization. This study investigates high‐power sunlight‐simulated UV‐i...

وصف كامل

التفاصيل البيبلوغرافية
الحاوية / القاعدة:Macromolecular Materials and Engineering
المؤلفون الرئيسيون: Wenqing Yan, Jimena de la Vega, Özen Eroğlu, Lavinia Heisenberg, Deyi Wang
التنسيق: مقال
اللغة:الإنجليزية
منشور في: Wiley-VCH 2024-05-01
الموضوعات:
atom transfer radical polymerization
free radical polymerization
high power UV
polymeric materials
thin films
الوصول للمادة أونلاين:https://doi.org/10.1002/mame.202300456
الوصف
الملخص:Abstract Under high power UV irradiation, radicals can be generated from double bonds through photodissociation, H‐abstraction, or oxygen initiation mechanisms. This eliminates the need for externally added initiators in photopolymerization. This study investigates high‐power sunlight‐simulated UV‐induced free radical polymerization under various experimental conditions, including the presence of inhibitors, open or closed systems, and partial degassing. Additionally, high‐power sunlight‐simulated UV‐induced atom transfer radical polymerization is explored by externally adding CuBr2/ligand (1:2) catalyst at 100 or 1000 ppm molar concentration of copper. Delicate fabrication of real‐world thin films, coatings, and delicate 3D composites further demonstrates the high reliability and versatility of this technology.
تدمد:1438-7492
1439-2054

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