Plasma source of charged particles for the formation of combined ion-electron beams

• 發表在: Весці Нацыянальнай акадэміі навук Беларусі: Серыя фізіка-тэхнічных навук
• Main Authors: D. A. Antonovich, V. A. Gruzdev, V. G. Zalesski, P. N. Soldatenko
• 格式: Article
• 語言: 俄语
• 出版: National Academy of Sciences of Belarus 2020-10-01
• 主題: plasma source of charged particles; electron-ion influence; electron beams; compensated ion beams
• 在線閱讀: https://vestift.belnauka.by/jour/article/view/612
• ISSN: 1561-8358; 2524-244X

One of the ways to increase the efficiency of the implementation of ion-plasma technologies of exposure to the surfaces of various materials is partial or full compensation of the positive charge of ions in the stream or on the treated surface, for which additional emitting systems are used that create compensating electron flows in the discharge space, accelerating gap or on the processed surface. It was previously shown that for the implementation of such a compensating effect, it is possible to use plasma sources of charged particles, capable of forming beams of both signs when the polarity of the accelerating voltage is changed. The main problem in this case is the difficulty in achieving simultaneously high emission efficiency of ions and electrons, since the conditions for their emission from plasma are significantly different. This article proposes a concept and a design developed on its basis for a prototype of a multi-discharge plasma electron-ion source for the joint or alternating formation of electron and ion beams. It is shown that the proposed design realizes the possibility of increasing the perveance by compensating for the space charge by particles of the opposite sign. A number of characteristics of the developed model of a plasma electron-ion source (current-voltage characteristics of the extraction of electrons and ions) are presented and its prospects for further development of an electron-ion source for industrial use on its basis are shown. Combined or alternating ion-electron beams formed in the presented source can be used to implement the technology of applying thin-film layers of metals, semiconductors, and dielectrics to maintain ionization processes and ensure stable discharge burning, compensation of both the space charge in the beam and the surface charge on the formed film.