Argon irradiation effects on the structural and optical properties of reactively sputtered CrN films

The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5×10-4 mbar, to a total thickness of 280 nm. The substrates were held at 150ºC duri...

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Bibliographic Details
Published in:	Science of Sintering
Main Authors:	Novaković M., Popović M., Bibić N.
Format:	Article
Language:	English
Published:	International Institute for the Science of Sintering, Beograd 2015-01-01
Subjects:	CrN films ion irradiation TEM RBS XRD ellipsometry
Online Access:	http://www.doiserbia.nb.rs/img/doi/0350-820X/2015/0350-820X1502187N.pdf

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