Effect of indole-3-butyric acid and Trichoderma harzianum Rifai on asexual cape gooseberry propagation (Physalis peruviana L.)

The growth and development of cape gooseberry plants obtained from cuttings is affected by microorganisms in the substrate and by the concentration of plant growth regulators applied during planting. Using a factorial design, the effect of four concentrations of indole-3-butyric acid (IBA) (0, 800,...

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發表在:Agronomía Colombiana
Main Authors: Oscar Humberto Alvarado-Sanabria, Javier Giovanni Álvarez-Herrera
格式: Article
語言:英语
出版: Centro Editorial of Facultad de Ciencias Agrarias, Universidad Nacional de Colombia 2014-12-01
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在線閱讀:http://www.scielo.org.co/scielo.php?script=sci_arttext&pid=S0120-99652014000300004&lng=en&tlng=en
實物特徵
總結:The growth and development of cape gooseberry plants obtained from cuttings is affected by microorganisms in the substrate and by the concentration of plant growth regulators applied during planting. Using a factorial design, the effect of four concentrations of indole-3-butyric acid (IBA) (0, 800, 1,200, and 1,600 mg L-1) and four suspensions of Trichoderma harzianum (0, 2·10(6), 3·10(6), and 4·10(6) cfu/mL) on the growth of cape gooseberry cuttings was evaluated. Apical cuttings were used, 20 cm long, from 20-month-old plants of the Colombian ecotype, which were planted in pots (2 L) using peat moss with burned rice husks as the substrate at a 3:1 ratio (v/v). The 800 mg L-1 of IBA application showed the highest accumulation of total dry mass (DM) and root DM. Moreover, 800 mg L-1 of IBA resulted in the highest leaf chlorophyll content, showing significant differences from 1,600 mg L-1, which had the lowest value. The 3·10(6) cfu/mL suspension of T. harzianum caused a greater accumulation of root DM and total DM and a higher leaf area in the plants. The most favorable interaction between the factors, which favors the growth of cape gooseberry plants obtained from cuttings, was observed with the application of 800 mg L-1 of IBA and 3·10(6) cfu/mL of T. harzianum.
ISSN:0120-9965