PENURUNAN CELAH PITA ZnO DENGAN IMPREGNASINYA PADA KARBON AKTIF
Abstract: The reduction of the band gap of the ZnO photocatalyst with its impregnation technique on activated carbon has been successfully carried out. The impregnation method involves absorption, dehydration at 100 oC, and calcination at 400 oC for 6 hours. Variations of Zn(NO3)2.6H2O used 5%, 10%,...
| 發表在: | Ekasakti Jurnal Penelitian dan Pengabdian |
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| Main Authors: | , |
| 格式: | Article |
| 語言: | 英语 |
| 出版: |
Universitas Ekasakti LPPM
2022-11-01
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| 主題: | |
| 在線閱讀: | https://ejurnal-unespadang.ac.id/index.php/EJPP/article/view/559 |
| 總結: | Abstract: The reduction of the band gap of the ZnO photocatalyst with its impregnation technique on activated carbon has been successfully carried out. The impregnation method involves absorption, dehydration at 100 oC, and calcination at 400 oC for 6 hours. Variations of Zn(NO3)2.6H2O used 5%, 10%, 15%, 20%, and 25% for 6 and 12 hours. Band gap test was carried out with UV-DRS. The optimum photocatalyst was achieved at 75 mg Activated carbon-ZnO 15% impregnated for 6 hours, with a decrease in the ZnO band gap to 2.62 eV the presence of Zn-O groups in the FTIR characterization results.
Abstrak: Penurunan celah pita fotokatalis ZnO dengan teknik impregnasinya pada karbon aktif telah berhasil dilakukan. Metode impregnasi melalui tahapan penyerapan, dehidrasi pada 100 oC, dan kalsinasi pada suhu 400 oC selama 6 jam. Variasi Zn(NO3)2.6H2O yang digunakan 5%, 10%, 15%, 20%, dan 25% selama 6 dan 12 jam. Uji celah pita dilakukan dengan UV-DRS. Fotokatalis optimum tercapai pada 75 mg Karbon aktif-ZnO 15% impregnasi 6 jam, dengan penurunan nilai celah pita ZnO menjadi 2,62 eV dan adanya gugus Zn-O pada hasil karakterisasi FTIR. |
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| ISSN: | 2746-7538 2747-0369 |