Crystallinity-Controlled Atomic Layer Deposition of Ti-Doped ZrO2 Thin Films

We investigated Ti-doped ZrO _2 deposition using a cyclopentadienyl tris(dimethylamino) zirconium (CpZr(NMe _2 ) _3 ) precursor and a titanium tetraisopropoxide (TTIP) precursor using an O _3 thermal atomic layer deposition process. In addition, the effect of Ti doping concentration on the chemical...

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Bibliographic Details
Published in:	ECS Advances
Main Authors:	Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon
Format:	Article
Language:	English
Published:	IOP Publishing 2024-01-01
Subjects:	dielectrics - high-k atomic layer deposition X-ray diffraction
Online Access:	https://doi.org/10.1149/2754-2734/ad1a75

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