Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide

The incorporation of nitrogen during sputtering of silicon carbide (SiC) target facilitates formation of different technologically significant phases. The bonding nature in these phases serve as the means of enhancing the hardness and toughness of the overall film getting deposited as shown by nano...

Full description

Bibliographic Details
Published in:Chemical Physics Impact
Main Author: A.S. Bhattacharyya
Format: Article
Language:English
Published: Elsevier 2024-06-01
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2667022423002931
_version_ 1850292238057209856
author A.S. Bhattacharyya
author_facet A.S. Bhattacharyya
author_sort A.S. Bhattacharyya
collection DOAJ
container_title Chemical Physics Impact
description The incorporation of nitrogen during sputtering of silicon carbide (SiC) target facilitates formation of different technologically significant phases. The bonding nature in these phases serve as the means of enhancing the hardness and toughness of the overall film getting deposited as shown by nanoindentation tests. Raman spectra gives the carbonaceous point of view based on existing models. A heterogenous crystallization was evident from getting a G-peak doublet. The experimental evidence of theoretically predicted SiC2N2 and Si2CN4 phases as per the phase diagram were found and confirmed by EDAX studies. These stable phases provided enhanced mechanical properties of the coatings
format Article
id doaj-art-e9b2bcbdcc01447586a4244dfd8fc1db
institution Directory of Open Access Journals
issn 2667-0224
language English
publishDate 2024-06-01
publisher Elsevier
record_format Article
spelling doaj-art-e9b2bcbdcc01447586a4244dfd8fc1db2025-08-19T23:34:50ZengElsevierChemical Physics Impact2667-02242024-06-01810045410.1016/j.chphi.2023.100454Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbideA.S. Bhattacharyya0Department of Metallurgical and Materials Engineering, Central University of Jharkhand, Ranchi 835205, India; Centre of Excellence in Green and Efficient Energy Technology (CoE GEET), Central University of Jharkhand, Ranchi 835205, India; Correspondence to: Department of Metallurgical and Materials Engineering, Central University of Jharkhand, Ranchi 835205, India.The incorporation of nitrogen during sputtering of silicon carbide (SiC) target facilitates formation of different technologically significant phases. The bonding nature in these phases serve as the means of enhancing the hardness and toughness of the overall film getting deposited as shown by nanoindentation tests. Raman spectra gives the carbonaceous point of view based on existing models. A heterogenous crystallization was evident from getting a G-peak doublet. The experimental evidence of theoretically predicted SiC2N2 and Si2CN4 phases as per the phase diagram were found and confirmed by EDAX studies. These stable phases provided enhanced mechanical properties of the coatingshttp://www.sciencedirect.com/science/article/pii/S2667022423002931Silicon carbideNitrogenSputteringBondingRaman
spellingShingle A.S. Bhattacharyya
Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide
Silicon carbide
Nitrogen
Sputtering
Bonding
Raman
title Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide
title_full Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide
title_fullStr Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide
title_full_unstemmed Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide
title_short Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide
title_sort growth of stable sic2n2 si2cn4 phases during nitrogen incorporated sputter deposition of silicon carbide
topic Silicon carbide
Nitrogen
Sputtering
Bonding
Raman
url http://www.sciencedirect.com/science/article/pii/S2667022423002931
work_keys_str_mv AT asbhattacharyya growthofstablesic2n2si2cn4phasesduringnitrogenincorporatedsputterdepositionofsiliconcarbide