Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double Layer

We propose an ambipolar chitosan synaptic transistor that effectively responds to binary neuroplasticity. We fabricated the synaptic transistors by applying a chitosan electric double layer (EDL) to the gate insulator of the excimer laser annealed polycrystalline silicon (poly-Si) thin-film transist...

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發表在:Nanomaterials
Main Authors: Ki-Woong Park, Won-Ju Cho
格式: Article
語言:英语
出版: MDPI AG 2022-09-01
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在線閱讀:https://www.mdpi.com/2079-4991/12/17/3063
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author Ki-Woong Park
Won-Ju Cho
author_facet Ki-Woong Park
Won-Ju Cho
author_sort Ki-Woong Park
collection DOAJ
container_title Nanomaterials
description We propose an ambipolar chitosan synaptic transistor that effectively responds to binary neuroplasticity. We fabricated the synaptic transistors by applying a chitosan electric double layer (EDL) to the gate insulator of the excimer laser annealed polycrystalline silicon (poly-Si) thin-film transistor (TFT) with Ni-silicide (NiSi) Schottky-barrier source/drain (S/D) junction. The undoped poly-Si channel and the NiSi S/D contact allowed conduction by electrons and holes, resulting in artificial synaptic behavior in both p-type and n-type regions. A slow polarization reaction by the mobile ions such as anions (CH<sub>3</sub>COO<sup>−</sup> and OH<sup>−</sup>) and cations (H<sup>+</sup>) in the chitosan EDL induced hysteresis window in the transfer characteristics of the ambipolar TFTs. We demonstrated the excitatory post-synaptic current modulations and stable conductance modulation through repetitive potentiation and depression pulse. We expect the proposed ambipolar chitosan synaptic transistor that responds effectively to both positive and negative stimulation signals to provide more complex information process versatility for bio-inspired neuromorphic computing systems.
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spelling doaj-art-eabd05c6e3e14fdaabd1a5f871bc07d62025-08-19T22:33:09ZengMDPI AGNanomaterials2079-49912022-09-011217306310.3390/nano12173063Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double LayerKi-Woong Park0Won-Ju Cho1Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, KoreaDepartment of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, KoreaWe propose an ambipolar chitosan synaptic transistor that effectively responds to binary neuroplasticity. We fabricated the synaptic transistors by applying a chitosan electric double layer (EDL) to the gate insulator of the excimer laser annealed polycrystalline silicon (poly-Si) thin-film transistor (TFT) with Ni-silicide (NiSi) Schottky-barrier source/drain (S/D) junction. The undoped poly-Si channel and the NiSi S/D contact allowed conduction by electrons and holes, resulting in artificial synaptic behavior in both p-type and n-type regions. A slow polarization reaction by the mobile ions such as anions (CH<sub>3</sub>COO<sup>−</sup> and OH<sup>−</sup>) and cations (H<sup>+</sup>) in the chitosan EDL induced hysteresis window in the transfer characteristics of the ambipolar TFTs. We demonstrated the excitatory post-synaptic current modulations and stable conductance modulation through repetitive potentiation and depression pulse. We expect the proposed ambipolar chitosan synaptic transistor that responds effectively to both positive and negative stimulation signals to provide more complex information process versatility for bio-inspired neuromorphic computing systems.https://www.mdpi.com/2079-4991/12/17/3063Ni-silicideambipolar channelpolycrystalline siliconthin-film transistorartificial synaptic transistorchitosan electrolyte
spellingShingle Ki-Woong Park
Won-Ju Cho
Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double Layer
Ni-silicide
ambipolar channel
polycrystalline silicon
thin-film transistor
artificial synaptic transistor
chitosan electrolyte
title Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double Layer
title_full Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double Layer
title_fullStr Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double Layer
title_full_unstemmed Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double Layer
title_short Binary-Synaptic Plasticity in Ambipolar Ni-Silicide Schottky Barrier Poly-Si Thin Film Transistors Using Chitosan Electric Double Layer
title_sort binary synaptic plasticity in ambipolar ni silicide schottky barrier poly si thin film transistors using chitosan electric double layer
topic Ni-silicide
ambipolar channel
polycrystalline silicon
thin-film transistor
artificial synaptic transistor
chitosan electrolyte
url https://www.mdpi.com/2079-4991/12/17/3063
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