Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting

Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricat...

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Bibliographic Details
Published in:Applied Sciences
Main Authors: Zhoufang Zeng, Gang Shi, Florian Ion Tiberiu Petrescu, Liviu Marian Ungureanu, Ying Li
Format: Article
Language:English
Published: MDPI AG 2021-10-01
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Online Access:https://www.mdpi.com/2076-3417/11/21/10097
Description
Summary:Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricate a residual-free TiO<sub>2</sub> pattern is proposed. The thermoplastic polymer with Ti<sup>4+</sup> salt was fast patterned at room temperature by imprinting, based on the different interfacial force. Then, the patterned thermoplastic polymer with Ti<sup>4+</sup> salt was induced into the TiO<sub>2</sub> lines without residual layer under the hydrothermal condition. This method provides a new idea to pattern metal oxide without residual layer, which is potentially applied to the gas sensor, the optical detector and the light emitting diode.
ISSN:2076-3417