Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting

Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricat...

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Bibliographic Details
Published in:	Applied Sciences
Main Authors:	Zhoufang Zeng, Gang Shi, Florian Ion Tiberiu Petrescu, Liviu Marian Ungureanu, Ying Li
Format:	Article
Language:	English
Published:	MDPI AG 2021-10-01
Subjects:	TiO<sub>2</sub> PMMA residual imprinting patterns arrays
Online Access:	https://www.mdpi.com/2076-3417/11/21/10097

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